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Atomic-scale sharpening of silicon tips in noncontact atomic force microscopy -: art. no. 016101

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PHYSICAL REVIEW LETTERS
卷 96, 期 1, 页码 -

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AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.96.016101

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The atomic-scale stability of clean silicon tips used in noncontact atomic force microscopy (NC-AFM) is simulated by ab initio calculations based on density functional theory. The tip structures are modeled by silicon clusters with [111] and [001] termination. For the often assumed Si(111)-type tip we observe the sharpening of the initially blunt tip via short-range chemical forces during the first approach and retraction cycle. The structural changes corresponding to this intrinsic process are irreversible and lead to stable NC-AFM imaging conditions. In opposition to the picture used in literature, the Si(001)-type tip does not exhibit the so-called two-dangling bond feature as a bulklike termination suggests.

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