4.6 Article

Determination of MgO/GaN heterojunction band offsets by x-ray photoelectron spectroscopy

期刊

APPLIED PHYSICS LETTERS
卷 88, 期 4, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.2170140

关键词

-

向作者/读者索取更多资源

MgO is a promising gate dielectric and surface passivation film for GaN transistors but little is known of the band offsets in the MgO/GaN system. X-ray photoelectron spectroscopy was used to measure the energy discontinuity in the valence band (Delta E-v) of MgO/GaN heterostructures in which the MgO was grown by rf plasma-assisted molecular beam epitaxy on top of thick GaN templates on sapphire substrates. A value of Delta E-v=1.06 +/- 0.15 eV was obtained by using the Ga 3d energy level as a reference. Given the experimental band gap of 7.8 eV for the MgO, this would indicate a conduction band offset Delta E-C of 3.30 eV in this system. (c) 2006 American Institute of Physics.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据