4.5 Article

Influence of sputtering conditions on ionic conductivity of LiPON thin films

期刊

SOLID STATE IONICS
卷 177, 期 3-4, 页码 257-261

出版社

ELSEVIER
DOI: 10.1016/j.ssi.2005.10.021

关键词

solid electrolyte; thin films; ionic conductivity; sputtering target density

向作者/读者索取更多资源

LiPON films were deposited using radio-frequency magnetron sputtering in a pure N-2 gas atmosphere. The influence of rf power, N-2 pressure, target-substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and 80 degrees C have indicated that ionic conductivity increases with nitrogen incorporation into the glass structure. An increase in the deposition rate with the target density has also been observed. (c) 2005 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.5
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据