期刊
JOURNAL OF ORGANOMETALLIC CHEMISTRY
卷 691, 期 4, 页码 811-816出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jorganchem.2005.10.027
关键词
silylene; insertion; Group 14 halides; disilane; trisilane
Reaction of the thermally stable silylene Si[(NCH2Bu)(2)C6H4-1,2] (1) [abbrev. as Si(NN)] with SiX4 (X = Cl or Br) afforded the disilanes (NN)SiX(SiX3) and [(NN)SiX](2) (X = Br only), the trisilane (NN)SiX-[(SiX3)Si(NN)] and the monosilane (NN)SiX2 (X = Br only), whereas treatment of 1 with MCl4 (M = Ge or Sn) yielded (NN)SiCl2 and MCl2, [(NN)SiBr](2) and (NN)SiBr2 were also obtained by reaction of 1 with Br-2. Reaction of 1 with PhSiCl3 yielded the disilane (NN)SiQSiCl(2)Ph) and trisilane [(NN)SiCl](2)SiClPh, whereas the disilane (NN)SiCl(SiCbMe) was obtained with MeSiCl3. The trisilane (NN)SiCl-[(SiCl3)Si(NN)] was thermally labile and converted to [(NN)SiCl](2)SiCl2 (c) 2005 Elsevier B.V. All rights reserved.
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