Characterisation of a pulsed rf-glow discharge in view of its use in OES

Pulsed radiofrequency glow discharges are studied in view of their possible advantages for optical emission spectroscopy (GD-OES). The excitation characteristics of a pulsed radiofrequency Grimm-type glow discharge are studied. The effects of a pulsed power supply on the sputtering are investigated and the effect on the emission yield for resonant and non-resonant emission lines is described. The enhancement of the emission yield through rf-power pulsing in the 10 Vs range is attributed to a temporal reduction of the self-absorption. The possibility of analysing heat-sensitive non-conductive materials and layers through pulsed rf-GDOES is demonstrated. The work opens several subjects and questions for further research on understanding the plasma processes linked to analytical rf-GD-OES.