期刊
IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 53, 期 2, 页码 323-328出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2005.863139
关键词
gate dielectrics; high-kappa; interfacial layer; mobility; reoxidation
The effects of the nitrogen profile in the SiON-interfacial layer (IL) on the mobility in FETs employing a HfAIO/SiON gate dielectric have been investigated. In order to suppress the interdiffusion between HfAlO and SiON, the nitrogen concentration in SiON should be higher than 15 at%, while the substrate interface should be oxygen-rich in order to suppress the mobility reduction. By using an NO reoxidation of NH3 formed 0.4-nm-thick silicon nitride, the mobility reduction due to the SiON-IL was successfully suppressed, and electron and hole mobility of 92 % and 88 % of those for SiO2 at V-g = 1.1 V were obtained for HfAIO/SiON with equivalent oxide thickness (EOT) of 1.1 nm. By using nitrogen profile engineered SiON-IL, good equvalent oxide thickness (EOT) uniformity, low EOT, low gate leakage current, low defect density and symmetrical threshold voltage were all achieved, indicating that a poly-Si/HfAlO/SiON gate stack would be a candidate as an alternative gate structure for low standby power FETs of half-pitch (hp)65 and hp45 technology nodes.
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