Porous anodic alumina (PAA) masks are employed for the template synthesis of high density silicon nanowire (SiNW) arrays on a silicon substrate by the vapor-liquid-solid method. The uniform-sized ordered arrays of nanopores in the PAA mask anchored to Si(111) substrate are shown to enable the realization of vertically aligned epitaxial SiNWs with uniform diameter and spacing. The average diameter of the wires is 72 nm while the density is 60 wires/mu m(2). The high packing density and tightly controlled dimensions of SiNWs obtained by this nonlithographic method allow their effective integration into nanodevices for mass production.
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