期刊
THIN SOLID FILMS
卷 496, 期 2, 页码 293-298出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2005.08.368
关键词
molybdenum disulphide; deposition process; X-ray diffraction; X-ray photoelectron spectroscopy
Molybdenum disulphide, MoS2, thin films have been deposited by chemical bath deposition method on glass and quartz substrate using ammonium tetrathiomolybdate as a single source precursor for Mo and S and subjected to vacuum heat treatment at different temperatures. X-ray diffraction of as-deposited film indicated its amorphous character and showed the development of poorly crystalline MoS2 thin film on increasing annealing temperature. The film has been characterized by energy dispersive X-ray analysis, X-ray photoelectron spectroscopy, scanning electron micrograph and the optical properties also have been studied. (c) 2005 Elsevier B.V. All rights reserved.
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