期刊
JOURNAL OF MATERIALS CHEMISTRY
卷 16, 期 7, 页码 685-697出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/b511301f
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The use of low dielectric constant (low-k) interdielectrics in multilevel structure integrated circuits (ICs) can lower line-to-line noise in interconnects and alleviate power dissipation issues by reducing the capacitance between the interconnect conductor lines. Because of these merits, low-k interdielectric materials are currently in high demand in the development of advanced ICs. This article reviews recent developments in the imprinting of closed nanopores into spin-on materials to produce low-k nanoporous interdielectrics for the production of advanced ICs.
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