期刊
JOURNAL OF MODERN OPTICS
卷 53, 期 5-6, 页码 713-718出版社
TAYLOR & FRANCIS LTD
DOI: 10.1080/09500340500283722
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We review the status of the field of quantum lithography, that is, the use of quantum-mechanical effects to write lithographic features with resolution finer than that achievable according to the Rayleigh criterion. In particular, we first review the original quantum lithography proposal by Boto et al., and we then describe the status of research aimed at realizing this process.
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