4.4 Article

Pattern guided structure formation in polymer films of asymmetric blends

期刊

SURFACE SCIENCE
卷 600, 期 5, 页码 1004-1011

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ELSEVIER
DOI: 10.1016/j.susc.2005.12.033

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atomic force microscopy; soft-lithography; pattern replication; self-assembly; polymer films; thin film structures

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Two off-critical blends of poly(2-vinylpyridine) and polystyrene, 2:3 and 3:2 (w:w) PVP:PS, were spin-cast (with varied domain scale R) onto periodically (lambda = 4 mu m) patterned substrate. The pattern consisted of two alternating symmetric stripes: Au attracting PVP and neutral self-assembled monolayer. The resulting droplet-type morphologies were recorded with Scanning Force Microscopy and examined with integral geometry approach. PVP-rich islands of the 2:3 PVP:PS films form, for a wide R/lambda range, strongly anisotropic morphologies. They show up, for R/lambda similar to 0.5, a weak lambda/2-substructure of smaller PVP droplets in addition to the domains periodic with lambda. The 3:2 blend exhibits morphologies with dominant lambda-structure of PVP ribbons, which encircle PS droplets. For R/lambda similar to 0.5, smaller PS domains are also present but no lambda/2-substructure is formed. The vertical bar chi(E)vertical bar-values of droplet surface density are reduced, as compared to homogeneous substrate, for the 3:2 blend (with vertical bar chi(E)vertical bar -> 0 for R similar to lambda). This effect is absent for the 2:3 mixture. (c) 2005 Elsevier B.V. All rights reserved.

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