The effect of the incident collision energy on the phase and crystallization kinetics of vapor deposited water films

Molecular beam techniques are used to grow water films on Pt(111) with incident collision energies from 5 to 205 kJ/mole. The effect of the incident collision energy on the phase of vapor deposited water films and their subsequent crystallization kinetics are studied using temperature programed desorption and infrared spectroscopy. We find that for films deposited at substrate temperatures below 110 K, the incident kinetic energy (up to 205 kJ/mole) has no effect on the initial phase of the deposited film or its crystallization kinetics. Above 110 K, the substrate temperature does affect the phase and crystallization kinetics of the deposited films but this result is also independent of the incident collision energy. The presence of a crystalline ice template (underlayer) does affect the crystallization of amorphous solid water, but this effect is also independent of the incident beam energy. These results suggest that the crystallization of amorphous solid water requires cooperative motion of several water molecules. (c) 2006 American Institute of Physics.