期刊
DIAMOND AND RELATED MATERIALS
卷 15, 期 4-8, 页码 898-903出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.diamond.2005.10.052
关键词
tetrahedral amorphous carbon; plasma CVD; surface characterization; surface structure
Hydrogenated tetrahedral amorphous carbon (ta-C:H) is advantageous as coating material for high-density magnetic and optical storage devices, due to its favorable combination of density and smoothness. An advantage of ta-C:H over tetrahedral amorphous carbon (ta-C) is the absence of macroparticles, often found in cathodic arc deposition of ta-C, and the hydrogen rich surface, compatible with the lubricant. As for taC, in order to increase the magnetic storage density, the ta-C:H thickness needs to be decreased. It is thus necessary to determine the minimum thickness for continuous and pin-hole free films. Here we investigate the roughness evolution of ta-C:H by atomic force microscopy and determine the roughness and growth exponents a and P. We find a very similar behaviour to ta-C, with the ta-C:H roughness slightly higher than the ta-C one for any given thickness. This confirms the smoothing effect of impinging ions during ta-C:H deposition. (c) 2005 Elsevier B.V. All rights reserved.
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