期刊
SMALL
卷 2, 期 4, 页码 458-475出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.200500390
关键词
colloids; lithography; nanomaterials; patterning; self-assembly
Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high-cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self-assembly with low defect concentrations, which. are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion. etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据