4.5 Article

Surface analysis of plasma deposited polymer films, 7 - In situ characterization of plasma deposited allylamine films by ToF-SSIMS, XPS and NEXAFS spectroscopy

期刊

PLASMA PROCESSES AND POLYMERS
卷 3, 期 3, 页码 288-298

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.200500168

关键词

allylamine; NEXAFS; plasma polymerization; ToF-SSIMS; XPS

向作者/读者索取更多资源

Plasma deposited allylamine films were studied by in situ ToF-SSIMS, XPS and NEXAFS Spectroscopy before exposure to ambient air. The influence of external, plasma power, and plasma parameters such as duty cycle. monomer flow rate on (i) unsaturation, (ii) branching and cross-linking, (iii) nitrogen surface concentration and (iv) retention of amino groups was investigated. Harder plasma conditions, which can be obtained when high duty cycles, high plasma power, and low monomer flow rates are employed, increase the unsaturated, branched and crosslinked character of the plasma deposited films, while the Surface concentration of N as well as the retention of the monomer's amino group decrease. As proven by NEXAFS findings and cross-checked by ToF-SSIMS results, the allylamine monomer's primary amino groups are partially transformed into other nitrogen functionalities during, its plasma polymerization. Amongst them imines and nitrites are the conversion products with the highest probabilities of formation. Another conversion channel is the formation of nitrogen species not participating in the film growth. This is the reason for an increased N loss in plasma deposited allylamine films as observed independently by XPS and ToF-SSIMS when the plasma parameters are changed from mild to hard.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.5
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据