Deposition of SiCN films using organic liquid materials by HWCVD method

SiCN films were deposited by Hot-wire CVD method using Hexamethyldisilazane (HMDS) which is an organic liquid material without exposition. It is found that SiCN films can be deposited using only HMDS as a source material. It is also found that the composition ratio of SiCN can be controlled by changing the flow rate of NH3, (c) 2005 Elsevier BY All rights reserved.