期刊
THIN SOLID FILMS
卷 503, 期 1-2, 页码 29-39出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2005.10.046
关键词
thin films; titanium dioxide; CVD; photocatalysis
Titanium dioxide (TiO2) thin films were prepared using Titanium [bis(dipiraloymethanate) diisopropoxide] (Ti(dpm)(2)(OPri)(2)) and Titanium isopropoxide (Ti(OPri)(4)) complex compound precursors by Chemical Vapour Deposition (CVD) and photo-assisted CVD. Structural information on TiO2 thin films was obtained in synchrotron radiation experiments: high-resolution Grazing Incidence X-ray Diffraction (GIXRD) and 0-20 XRD experiments were performed on the high-resolution powder diffractometer at the Hamburg Synchrotron Laboratory. Chemical composition of thin films was Studied by high-resolution Laser Ionization Mass Spectrometry technique, surface composition by X-ray Photoelectron Spectroscopy, and surface morphology by Atomic Force Microscopy. Photocatalytic activity of TiO2 thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High Performance Liquid Chromatography. (c) 2005 Elsevier B.V. All rights reserved.
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