We present a wet chemical process for nanoscale texturing of Si surfaces, which results in an almost complete suppression of the reflectivity in a broad spectral range, leading to black Si surfaces. The process affects only the topmost 200-300 nm of the material and is independent of the surface orientation and doping. Thus, it can be applied to various structural forms of bulk silicon (single, poly-, or multicrystalline) as well as to thin Si films (amorphous or microcrystalline). The optical properties of various black Si samples are presented and discussed in correlation with the surface morphology.
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