期刊
MACROMOLECULAR RESEARCH
卷 14, 期 3, 页码 300-305出版社
POLYMER SOC KOREA
DOI: 10.1007/BF03219085
关键词
irradiation; photobase generator; positive photoresist; photosensitive polyimide; photosensitive compound
The chemical structure of a semi-aromatic polyimide-I, which was prepared by the chemical imidization of cyclopentanetetracarboxylic dianhydride and 2,2-bis(4-aminophenyl)hexafluoropropane, was characterized by C-13-NMR spectroscopy. The chemically imidized polyimide-I was used for the preparation of a photosensitive polyimide (PSPI) through the addition of benzophenone and benzophenone oxime hexamethylene diurethane (BOHD), a photobase generator containing oxime-urethane groups. The polyimide-1 film containing benzophenone and BOHD was not soluble in 2.38 wt% tetrabutylammonium hydroxide solution in H2O. However, it became soluble following irradiation with 3 10 nm UV light. A positive tone image with a resolution of 5 mu m was obtained with this PSPI, having sensitivity (D-c) of 1.2 J/cm(2) and contrast (gamma(p)) of 1.08. Thus, a polyimide, which is not intrinsically photosensitive, can become photosensitive through the addition of a photobase generator containing oxime-urethane groups as a photosensitive compound.
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