期刊
INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS
卷 53, 期 -, 页码 98-103出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.ijrmhm.2015.05.014
关键词
Tungsten; High purity; Electrode; Sputtering target
High purity (>99.999 wt.%, 5N) or ultra-high purity (>99,9999 wt.%, 6N) tungsten (W) electrodes are vital to the performance and lifetime of high intensity discharge (HID) lamps. On the other hand, alloys based on high purity (>99.99 wt.% or 99.995 wt.%, 4N or 4N5) Ware used as sputtering targets to deposit the films in semiconductor devices. In this study, a highly efficient and cost-saving method for mass producing 6N W powder has been developed. The 5N and 6N W rods and wires for the electrodes of HID lamps have been manufactured by using this powder. In addition, vacuum hot pressing has been employed to prepare 4N5 tungsten-titanium (W-Ti) and 4N tungsten-silicon (W-Si) sputtering targets successfully. The impurities and microstructures of the developed high purity W products have been investigated and are suitable for lighting, semiconductor and photovoltaic applications. (C) 2015 Elsevier Ltd. All rights reserved.
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