期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
卷 45, 期 6A, 页码 5210-5212出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/JJAP.45.5210
关键词
helicon discharge; reactive plasma; chemical vapor deposition; carbon nanowalls; high speed growth
Carbon nanowalls (CNWs) are synthesized under pure methane gas (CH4) using helicon plasma-enhanced chemical vapor deposition. CH4 in the helicon discharge is effectively dissociated to hydrogen atoms and hydrocarbon radicals, resulting in the formation of CNWs on a Ni substrate only from CH4. CNWs are grown up at a high growth rate of 18 mu m/h.
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