In a rear emitter n-type passivated emitter, rear totally diffused cell design, the boron diffused emitters are placed at the rear surface of n-type silicon substrates. This has significantly improved the cell efficiency up to 22.7%. A 170 mu m thin float zone substrate and a 1.5 Omega cm modest substrate resistivity helped these cells to achieve highly efficient carrier transportation to the rear emitter. These 22 cm(2) large cells are scribed off from the silicon wafer, representing efficiencies for applicable devices. These rear emitter cells also demonstrated stable performances both under one-sun illumination and after a few months storage in nitrogen. (c) 2006 American Institute of Physics.
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