期刊
CHEMISTRY OF MATERIALS
卷 18, 期 13, 页码 3145-3150出版社
AMER CHEMICAL SOC
DOI: 10.1021/cm0606631
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We report an atmospheric-pressure deposition method for preparing well-adhered and compact CuInS2 films. The precursor film is obtained by a solution-coating technique and is subjected to a low-cost and safe one-step reduction-sulfurization treatment. A maximum thickness of 300 nm is achieved per layer, and up to three layers were sulfurized at a time. The obtained films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and visible-near-infrared (vis-NIR) spectrophotometry.
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