期刊
MATERIALS LETTERS
卷 60, 期 15, 页码 1931-1935出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.matlet.2005.12.055
关键词
sputtering; powder compacted target; Al-doped ZnO; transparent conducting
We demonstrated the characterization of Al-doped ZnO thin film deposited from powder compacted target using RF magnetron sputtering. Various film thicknesses and substrate temperatures were used as deposition parameters for the purpose of obtaining optimum results. It shows that deposited AZO films have stronger preferred (002) c-axis crystalline orientation as both film thickness and Substrate temperature increased. Film's resistivity and sheet resistance significantly decreased as film thickness increased. Higher surface roughness and irregular surface structure occurred at 200 degrees C substrate temperature. Films possess high optical transmittance of approximately 90% and demonstrated an optical band gap of 3.35 eV. At 200 degrees C substrate temperature, a resistivity of 4.4 x 10(-3) Omega cm was obtained. (c) 2005 Elsevier B.V. All rights reserved.
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