4.6 Article

Fabrication and photoelectrochemical properties of porous ZnWO4 film

期刊

JOURNAL OF SOLID STATE CHEMISTRY
卷 179, 期 8, 页码 2562-2570

出版社

ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jssc.2006.05.004

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ZnWO4 film; photoelectrochemistry; photocatalysis

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Porous ZnWO4 films have been fabricated on Indium-tin oxide (ITO) glass and its photoelectrochemical properties and high photocatalytic activities towards degradation of rhodamine B (RhB) has been investigated. Using amorphous heteronuclear complex as precursor and with the addition of polyethylene glycol (PEG, molecular weight = 400), the porous ZnWO4 films have been achieved at the temperature of 500 degrees C via dip-coating method. It is composed of approximately 70 nm-sized particles and exhibits substantial porosity. The textures and porosity of ZnWO4 films are dependent on preparation factors, such as the ratio of precursor/PEG and the annealing conditions. The formation mechanism of porous ZnWO4 films was proposed. The porous ZnWO4 films exhibited high photocatalytic activities towards degrading RhB. The top of valence band and the bottom of the conduction band was estimated to be -0.56 and 3.45 eV (vs. saturated calomel electrode (SCE)), respectively. (c) 2006 Elsevier Inc. All rights reserved.

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