High-quality CdTe nanoparticles stabilized with thioglycolic acid (TGA) are patterned on SiO2/ Si surfaces using microcontact printing (mu CP). Due to the weak interaction of the nanoparticles with the stamp surface, tailoring of gas flow rate during the inking process as well as the type and scale of the patterns on the stamp are used to control the distribution of the nanoparticles on the structured stamp surface. This distribution is then transferred the printed regions. Either edge printing or homogeneous printing can be achieved under optimized conditions. In addition, new structures such as nanowires form under certain conditions.
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