Diamond photonic band gap synthesis by umbrella holographic lithography

The authors demonstrate that optical interference lithography yields diamond photonic band gap (PBG) architectures with PBGs as large as 25% when the exposed photoresist is replicated with silicon. This process utilizes five linearly polarized beams propagating from the same half-space (umbrella configuration), a setup considerably simpler than the widely studied counterpropagating four-beam setup. Using the umbrella configuration, this diamond structure is also achieved by two or more exposures using fewer interfering laser beams. (c) 2006 American Institute of Physics.