Correlation between plasma dynamics and porosity of Ge films synthesized by pulsed laser deposition

The porosity of Ge films deposited by pulsed laser deposition in an inert gas atmosphere is observed to be directly correlated with the kinetic energy of ablated species. The deposition conditions were modified by varying the pressure and the target-substrate distance. The evolution of the kinetic energy of ablated species as a function of deposition parameters, such as distance from target and background gas pressure, is described in terms of a theoretical model. The relationship between the density of Ge films and the kinetic energy of ablated species is discussed. (c) 2006 American Institute of Physics.