Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source

The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N-2 and H-2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in I-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown. (C) 2006 Elsevier Ltd. All rights reserved.