期刊
MICROELECTRONIC ENGINEERING
卷 83, 期 10, 页码 1966-1970出版社
ELSEVIER
DOI: 10.1016/j.mee.2006.02.004
关键词
nanocomposite; silica; SU-8; microfabrication
A new nanocomposite photoresist based on SU-8 epoxy resin has been developed. It consists in a homogeneous dispersion of nanosilica particles in the negative tone photosensitive SU-8. The nanocomposite photoresist is more sensitive than the SU-8 photoresist and the photopatterned composite structures show low stress and less cracks than pure SU-8 structures. No significant resolution difference has been observed for both materials. (c) 2006 Elsevier B.V. All rights reserved.
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