Metal-insulator-semiconductor structures, comprised of silicon quantum dot films grown by plasma-enhanced chemical vapor deposition, were fabricated on Si wafers. The devices showed a negative differential resistance, as a result of the resonant tunneling and the very high peak-to-valley current ratios of 2240 under illumination and 390 in the dark at room temperature, which are much higher than the corresponding values of other Si tunneling devices. The peak voltage was reduced down to 1.9 V by increasing the doping concentration of the wafer and reducing the device area. The structure shows promise for use in solid-state switch applications. (c) 2006 American Institute of Physics.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据