期刊
NANOTECHNOLOGY
卷 17, 期 19, 页码 4909-4911出版社
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/17/19/021
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In-plane anisotropic nanostructures have been fabricated using deep ultraviolet (UV) lithography. Dimensions from over 100 nm down to 50 nm with periods of 300 nm for a diamond shape and 159 nm for a triangular shape can be obtained using one mask by the over-exposure technique. Patterns transferred to a substrate to create magnetic films containing dots and antidots have been demonstrated. Hysteresis loop measurements proved higher coercivity for patterned films compared with continuous film.
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