Diffraction-aided laser-induced microstructuring of thin TiO2 films on glass

Thin films of TiO2 are deposited by magnetron sputtering on glass substrate and are irradiated by ultraviolet radiation using a KrF excimer laser. These thin films are patterned with a razor blade placed in the way of the radiation. When the fluence is in the 1250-1550 mJ/cm(2) range, a regular structure appears, with controlled ablation of the films. It is shown that above a critical local fluence, the ablated depth varies linearly with the local fluence. The proportionality factor is shown to be equal to two photons per evaporated molecule. (c) 2006 American Institute of Physics.