The authors report determination of interlayer composition with subnanometer sensitivity at the buried interfaces using soft x-ray resonant reflectivity technique. Near the absorption edge, fine structure features of energy-dependent atomic scattering factor are sensitive to the composition, and can be exploited for determination of composition at the buried interfaces. This technique is demonstrated for a Mo-Si multilayer system using soft x-ray resonant reflectivity measurement. (c) 2006 American Institute of Physics.
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