期刊
IEEE ELECTRON DEVICE LETTERS
卷 27, 期 11, 页码 877-880出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2006.884720
关键词
access resistance; gallium nitride; high-electron-mobility transistor (HEMT); high-frequency performance; low temperature measurements
This letter studies the effect of access resistance on the high-frequency performance of AlGaN/GaN high-electronmobility transistors. To systematically reduce the sheet access resistance, the transistors were measured at different temperatures. The increase of mobility at lower temperatures allowed more than four-fold reduction in the sheet access resistances. Both the current- and power-gain cutoff frequencies are observed to increase at low temperatures. Also, the intrinsic effective velocity has been estimated in these devices, as well as the parasitic delays involved in the final performance. Channel charging delay, which was expected to be most sensitive to parasitics, is observed to decrease at low temperatures. However, the drain delay, intrinsic delay, and effective electron velocity remain unaffected by temperature.
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