4.6 Article

Study of impact of access resistance on high-frequency performance of AlGaN/GaN HEMTs by measurements at low temperatures

期刊

IEEE ELECTRON DEVICE LETTERS
卷 27, 期 11, 页码 877-880

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2006.884720

关键词

access resistance; gallium nitride; high-electron-mobility transistor (HEMT); high-frequency performance; low temperature measurements

向作者/读者索取更多资源

This letter studies the effect of access resistance on the high-frequency performance of AlGaN/GaN high-electronmobility transistors. To systematically reduce the sheet access resistance, the transistors were measured at different temperatures. The increase of mobility at lower temperatures allowed more than four-fold reduction in the sheet access resistances. Both the current- and power-gain cutoff frequencies are observed to increase at low temperatures. Also, the intrinsic effective velocity has been estimated in these devices, as well as the parasitic delays involved in the final performance. Channel charging delay, which was expected to be most sensitive to parasitics, is observed to decrease at low temperatures. However, the drain delay, intrinsic delay, and effective electron velocity remain unaffected by temperature.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据