Aligned carbon nanotubes fabricated by thermal CVD at atmospheric pressure using Co as catalyst with NH3 as reactive gas

Co is used as a catalyst for chemical vapor deposition (CVD) of vertically aligned multi-walled carbon nanotubes (CNTs) in a tube filmace at atmospheric pressure. C2H2 and NH3 were used for the carbon feedstock and reaction control, respectively. The CVD process parameters determine the chemical properties of the Co particles and subsequently the morphologies and field emission behavior of CNTs as they strongly depend upon the catalyst condition. The flow rate ratio of NH3 to C2H2 is shown to be central to the synthesis of vertically aligned CNTs. Repeatable synthesis of vertically aligned CNTs at atmospheric pressure in a tube furnace is cost effective for large area deposition of such structures which may be used, for example, in vacuum field emission devices. (c) 2006 Elsevier B.V All rights reserved.