期刊
APPLIED SURFACE SCIENCE
卷 253, 期 3, 页码 1616-1619出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2006.02.053
关键词
femtosecond laser; laser micromachining; incubation effect; laser fluency threshold
Ablation process of 1 kHz rate fermosecond lasers (pulse duration 148 fs, wavelength 775 nm) with Au films on silica substrates has been systemically studied. The single-pulse threshold can be obtained directly. For the multiple pulses the ablation threshold varies with the number of pulses applied to the surface due to the incubation effect. From the plot of accumulated laser fluence N x phi(th)(N) and the number of laser pulses N, incubation coefficient of An film can be obtained (s = 0.765). As the pulse energy is increased, the single pulse ablation rate is increasing following two ablation logarithmic regimes, which can be explained by previous research. (c) 2006 Elsevier B.V. All rights reserved.
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