期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
卷 45, 期 46-50, 页码 L1289-L1292出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/JJAP.45.L1289
关键词
metal gate; high-k dielectrics; work function; Fermi level pinning; oxygen vacancy
Typical p-metals show similar effective work functions close to p(+) polycrystalline silicon (poly-Si) pinning position irrespective of materials after high-temperature process. We found that this phenomenon can be explained by the modified Vo model taking into account the effect of Si substrate. Oxygen absorption by Si substrate and subsequent electron transfer to metal electrode clearly explain the p-metal Fermi level pinning as well as p(+) poly-Si pinning. In addition, unsuppressed Fermi level pinning by insertion of barrier layer at p(+) poly-Si/barrier layer/high-k gate stack, which is one of the open issues concerning p(+) poly-Si pinning, has the same overall reaction scheme. The modified model also consistently explains this phenomenon.
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