Characterization of mechanical properties of thin films using nanoindentation test

Using finite element modeling (FEM), this work investigates using finite element modeling (FEM) the mechanical behavior of film on substrate composites during the penetration of a rigid tip. In order to understand the magnitude of the substrate effect, the difference of strain gradient through the thickness of a given layer, deposited first on a softer substrate and then on an harder substrate can be observed. In this specific case, up to a critical ratio (h/t) = 0.35 (with h the indentation depth and t the film thickness), the mechanical behavior of the layer is quite similar. But, for h/t > 0.35, two different behaviors may be observed: (i) in the first case H-j/H-s <= I (with H-f and H-s, respectively, the film and substrate hardness values), the total strain remains contained within the film thickness up to a ratio h1t close to I and (ii) in the second case H-f/H-s >= 1, the total strain extends deeply into the substrate. These results show that the empirical 10% rule is not valid, even for a hard film on a softer substrate. The main error is caused by a wrong estimation of the contact depth between the indenter tip and the film surface. Indeed, the simulation runs exhibit the formation of pile-up depending on the ratios (h/t) and Y-f/Y-s (with Y-f and Y-s, respectively, the film and substrate yield stress values). As a function of the used model for calculating the contact depth, at least three variation of hardness may be found from load-displacement curves obtained by FEM. In these conditions, it seems ambiguous to try to determine a weighting function to extract meaningful mechanical properties of the thin film. Another way to determine film properties consists in using the loading phase. A relationship between the applied load (P) and the indentation depth (h) is studied during the loading phase. For the case of a soft film on harder substrate (H-f/H-s <= 1), it is possible to determine the yield stress of the film, from the previous relationship. This approach is applied to experimental amorphous Al2O3 films formed by electron beam evaporation on silicon substrate. (C) 2006 Elsevier Ltd. All rights reserved.