期刊
ADVANCED MATERIALS
卷 18, 期 23, 页码 3149-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200601191
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Rapid fabrication of uniform nanopores and nanopore arrays in Si3N4 membranes (see figure) is achieved using a high-intensity electron beam. Expansion or contraction of the pores under electron-beam irradiation is observed and utilized for the controlled fabrication of highly uniform nanopores in the size range 2-20 nm. Our nanopores exhibit a truncated double-cone structure, as revealed by 3D-TEM tomography.
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