4.4 Article

Small angle X-ray scattering measurements of porous low-k films using synchrotron radiation

期刊

THIN SOLID FILMS
卷 515, 期 4, 页码 2410-2414

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ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2006.05.012

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dielectrics; nanostructures; positron spectroscopy; X-ray scattering

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Synchrotron radiation has been employed to analyze the difference in three representative kinds of spin on glass (SOG) films systematically based on a small angle X-ray scattering (SAXS) technique. The amount of scattering by pores in a SOG film of organic non-template type was found to be extremely smaller than that in low-k films of a template type. The pore size in the organic non-template type SOG film was estimated to be smaller than that of the template type low-k films. A position annihilation lifetime spectroscopy was also applied to confirm the SAXS results. It was found that the consideration of properties of specific low-k films and a scanning strategy in SAXS measurements were important for evaluating the pores of low-k films. (c) 2006 Elsevier B.V All rights reserved.

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