Atmospheric pressure microplasma jet as a depositing tool

An atmospheric pressure microplasma jet is developed for depositing homogeneous thin films from C2H2. The adjustment of the gas flow through the microplasma jet assures optimal flow conditions as well as minimizes deposition inside the jet. In addition, the formation of an argon boundary layer surrounding the emerging plasma beam separates the ambient atmosphere from the flow of growth precursor. Thereby the incorporation of nitrogen and oxygen from the ambient atmosphere into the deposited film is suppressed. Soft polymerlike hydrogenated amorphous carbon (a-C:H) films are deposited at the rate of a few nm/s on the area of a few square millimeters. (c) 2006 American Institute of Physics.