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Molecular beam epitaxy of phase pure cubic InN

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APPLIED PHYSICS LETTERS
卷 89, 期 26, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.2422913

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Cubic InN layers were grown by plasma assisted molecular beam epitaxy on 3C-SiC (001) substrates at growth temperatures from 419 to 490 degrees C. X-ray diffraction investigations show that the layers have zinc blende structure with only a small fraction of wurtzite phase inclusions on the (111) facets of the cubic layer. The full width at half maximum of the c-InN (002) x-ray rocking curve is less than 50 arc min. The lattice constant is 5.01 +/- 0.01 A. Low temperature photoluminescence measurements yield a c-InN band gap of 0.61 eV. At room temperature the band gap is about 0.56 eV and the free electron concentration is about n similar to 1.7x10(19) cm(-3). (c) 2006 American Institute of Physics.

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