期刊
CURRENT APPLIED PHYSICS
卷 7, 期 2, 页码 211-214出版社
ELSEVIER
DOI: 10.1016/j.cap.2006.04.002
关键词
atmospheric pressure glow plasma; PR ashing
Homogeneous glow plasma at atmospheric pressure without streamers and arcing was generated by making use of a radio-frequency (RF, 13.56 MHz) power supply. Oxygen gas was added to Ar/He gas as reactive agents for photo-resist (PR) ashing. The input power, flow rate, oxygen concentration, treatment time, substrate temperature are controlled for high ashing rate and uniform ashing. Thickness of PR film was measured by NANOSPEC (AFT200) and alpha-Step (P-10). An unstable discharge occurs destroying the uniformity, when the input power exceeds a threshold value determined from the distance between the substrate and plasma source. An increase of oxygen quantity or temperature increase makes high ashing rate, but the ashing surface is rugged. The PR ashing rate was related to oxygen atom in plasma. The number of treatment may not be important in PR ashing at the atmospheric pressure. (c) 2006 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据