Ion debris mitigation from tin plasma using ambient gas, magnetic field and combined effects

Mitigation of energetic ions from laser produced tin plasma is one of the principal issues in the development of an extreme ultraviolet lithographic light source. We explored the possibility of using an ambient gas and/or a magnetic field for controlling the energetic ions from tin plasma. Hydrogen, helium and argon gases provide good transmission to 13.5 nm and are found to be an effective stopper for tin ions. Absorption of in-band radiation limits the density of gas below levels needed to completely protect optics. Tin ion ranges in buffer gases were estimated using the Monte Carlo simulation code SRIM and compared with experimental results. The presence of a moderate transverse magnetic field of 0.64 T slowed the propagation of fast moving tin ions but failed to stop them. The synergistic effect of a combination of magnetic field and an ambient gas is found to be very promising for mitigating tin ions without exceeding EUV gas absorption limits.