期刊
SENSORS AND ACTUATORS A-PHYSICAL
卷 133, 期 2, 页码 311-316出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.sna.2006.05.047
关键词
near-field scanning optical microscopy; femtosecond laser; Bethe-Bouwkamp model
A near-field scanning optical microscopy (NSOM) and a double-frequency femtosecond laser (400 nm, 100 fs) were applied to push the optical resolution further down to sub-50 nm on thin UV photoresist. A 20-nm feature size can be obtained. It is at a resolution of lambda/20 (lambda: laser wavelength) and a/2 (a: NSOM probe aperture diameter), respectively. It is proved that laser power and exposure time can affect feature size of lithography patterns. In this paper, the effect of probe-to-sample distance on dot-pattern features is studied, and different dot-pattern shapes are generated: dumbbell-dot, ellipsoid-dot and circle-dot. The simulated light field spatial distributions across the nano-aperture based on Bethe-Bouwkamp model is found to agree with experimental results very well. (c) 2006 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据