The fabrication of magnetic elements containing constrictions is demonstrated using nanostencil lithography in dynamic mode, i.e., by a continuous translation of a shadow mask with respect to the sample. The authors quantify the current resolution limits of this technique, demonstrating edge profile widths of 120 nm and thickness variations of 10%, and discuss prospects and challenges of dynamic nanostencil lithography. (c) 2007 American Institute of Physics.
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