4.4 Article

A six-circle diffractometer system for synchrotron X-ray studies of surfaces and thin film growth by molecular beam epitaxy

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ELSEVIER SCIENCE BV
DOI: 10.1016/j.nima.2006.11.056

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X-ray diffractometer; X-ray surface diffraction; molecular beam epitaxy; low temperatures

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A new ultrahigh vacuum (UHV) surface diffractometer system equipped with molecular beam epitaxy (MBE) capabilities has been developed. It has a versatile 6-circle configuration for defining the diffraction geometry, and a three-axis translation stage for controlling the sample position. Rugged mechanical components are employed in the design to allow accurate diffraction measurements. Sample cooling is facilitated by passing liquid nitrogen into a reservoir in the base of a sample mount. The sample can be heated to very high temperatures by either direct current heating or electron beam bombardment. During film growth and processing, the sample temperature, monitored by thermocouples, can be continuously and rapidly varied between similar to 110K to above room temperature. A charge coupled device (CCD) camera, attached to the p circle, allows rapid reciprocal space mapping for real time studies of sample growth and evolution during deposition and annealing. A beam stop and a baffle are implemented to minimize stray scattered radiation. (c) 2006 Elsevier B.V. All rights reserved.

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