期刊
APPLIED SURFACE SCIENCE
卷 253, 期 10, 页码 4507-4511出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2006.10.004
关键词
porous silicon; fractals; nanoscale systems; simulation
By means of scanning electron microscopy and computer simulation, we have investigated the microstructures of a 23-mu m-thick porous silicon (PS) film and a 6-mu m-thick PS film. The two films give off strong visible emissions when excited by the 254 nm light. For the 23-mu m-thick PS film, both of its cross-sectional and top-surface morphologies exhibit self-similarity whose small-scale and large-scale microstructures resemble one another. For the 6-mu m-thick PS film, self-similar cracks are developed on its top surface. Our results have demonstrated that the microstructures of PS films exhibit the characteristics of fractals. With box counting method, the fractal dimensions of the PS films are calculated to be about 2.3-2.6. Based on the model of diffusion-limited aggregation, the fractal growth processes have been simulated for the PS films. (c) 2006 Elsevier B.V. All rights reserved.
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