期刊
SURFACE & COATINGS TECHNOLOGY
卷 201, 期 14, 页码 6437-6444出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2006.12.011
关键词
CN film; dielectric barrier discharge; XPS; infrared spectroscopy
Carbon nitride films have been deposited by dielectric barrier discharge with a CH4/N-2 gas mixture at different conditions. Fourier Transform Infrared (FTIR) spectroscopy, X-ray photo electron spectroscopy (XPS), Raman spectroscopy, Atomic force microscopy (AFM) and ellipsometry were used to systematically study chemical composition, bond structure and surface morphology of deposited films. Various bonds between carbon, nitrogen, hydrogen, and also oxygen were observed. (c) 2006 Elsevier B.V. All rights reserved.
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